SENTRY 1510 MANUAL

The SENTRY 1510 Manual process pressure control system adds a new level of control to processing chambers running at atmospheric pressure, such as RTP and epitaxy, and atmospheric pre-load chambers. Pressure control improves process repeatability and minimizes contamination, two critical areas for today's semiconductor processes.

Operating with a single moving part, the Manual SENTRY 1510 responds instantly to changes such as a chamber-opening event. For applications with a single set point requirement, the manual SENTRY 1510 provides superior pressure control at minimal cost.

Features

• Air-flow regulation with millisecond response time
• Single moving part for high reliability
• Fail-safe operation
  

Benefits

For RTP/Epitaxy:

• Controls contamination through prevention of backstreaming
• Improves process repeatability
• Reduces edge effects
• Saves energy
  
  For preload chambers:
  
• Controls contamination
• Saves energy
  

Primary Applications

• RTP
• Epitaxy
• Preload chambers

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