Diffusion Furnace and Thermal Process Control

DIFFUSION FURNACE AND THERMAL PROCESS CONTROL

Diffusion Furnace

Brooks systems allow you to control pressure in atmospheric vertical diffusion chambers and other atmospheric process chambers. Controlling pressure in processes such as thermal oxidation and diffusion improves process repeatability. By optimizing the process pressure it is also possible to extend the usable load size in those critical processes. The rapid response of the Brooks' SENTRY Exhaust Control Systems provides a stable process environment even with widely fluctuating house exhaust or gas flows. HCL fumes can be contained, improving workplace safety.

APCVD

APCVD process uniformity and overall process quality are directly affected by process exhaust. Unstable exhaust will cause degradation in uniformity. Typical APCVD facility exhaust requirements are in the range of -2.5 inches of water column. The SENTRY 1000 system, configured with a standard option booster fan, provides a controlled, stable exhaust source for the APCVD process. SENTRY 1000 technology responds rapidly to changes in facility exhaust pressure providing isolation to the process.

Rapid Thermal Process

There are several solutions for the Rapid Thermal Process (RTP) through three versions of the SENTRY 1510 product line: Automated, Pneumatic & Manual. One application is the direct control of the exhaust pressure of the process chamber. With its fast response to process gas changes, and equally fast response to those exhaust changes, SENTRY 1510 technology provides stabilization and isolation to protect the process.
Another important application for RTP is the pressure control of the load lock. The SENTRY 1510 is available in a dual-sense port configuration with both positive and negative ports of its differential pressure transducer accessible for connection to the RTP system. The SENTRY 1510 enables the capability to establish controllable pressure relationships between the clean room, load lock, and process chamber. Stable control of these differential pressure relationships allow for the minimization of particle transport and an increase in process quality.

Diffusion/Pressure/Thermal Platforms

SENTRY 1510 Automated

The SENTRY 1510 controls pressure in atmospheric diffusion furnaces and other atmospheric process chambers improving process repeatability and reducing contamination.

SENTRY 1510AP

The SENTRY 1510 controls oxidation and diffusion process to a selected absolute pressure, protecting from barometric fluctuations and enabling facilities at different altitudes to run the same process.

SENTRY 1510 Pnuematic

The SENTRY 1510 dual-stage pneumatic controller provides superior pressure control by enabling two set points: one for load/unload, for example, and the other for process.

SENTRY 1510 Manual

For applications with a single set point requirement, the manual SENTRY 1510 provides superior pressure control at minimal cost.