|
 |
|
ARV 2000
 The ARV 2000 offers precise, full-range control over process pressure and reduces the potential for contamination in non-critical processes. The unique aerodynamic shape of its two rotating vanes minimizes resistance across the valve, allowing the process to run very close to the available vacuum. Setting it apart from traditional valves is the ARV-2000's fast set point control technology that creates a rapid response to set point not achievable with conventional PID control. The unique design of the control valve combined with an adaptive control strategy provides dynamic, dependable control over process pressure.
Features
- Linear response across entire range
- Adaptive fast set point technology
- Unique aerodynamic flow path
- Easy to install; minimal maintenance
Benefits
- Precise control through full range
- Maximum vacuum available to the process
- Improved process uniformity
- Rapid response to set point
- Adaptable and upgradeable
- Saves Energy
Primary Applications
- Coat and develop tracks
- Hot plates
- Other, non-critical processes requiring pressure or flow control
Back to Wafer Track Exhaust Control Platforms
Next Page
  
|
|