WAFER TRACK EXHAUST CONTROL

Our latest technology provides superior solutions to point-of-use exhaust control challenges for semi-conductor process tools. Designed for either mass flow or static pressure (vacuum) process control, this technology prevents fluctuations from your house exhaust system from affecting your process.

Wafer Track Exhaust Control Platforms

ARV 2000

The ARV 2000 offers precise, full-range control over process pressure and reduces the potential for contamination in non-critical processes.

SENTRY 1000 Automated

The SENTRY 1000 Automated Exhaust Controller, with the TIM (Tool Interface Module), offers a full range of programmable set points, making the SENTRY 1000 Automated ideal for any process requiring immediate point-of-use air-flow regulation.

SENTRY 1000-300

The SENTRY 1000-300 with microprocessor based TIM has now been enhanced with the Universal Fast Set-Point (UFSP) algorithm for faster response to process set-point change commands.

SENTRY 9000

The SENTRY 9000 Automated Exhaust Controller, with the TIM (Tool Interface Module), is ideal for tracks with lower flow requirements, such as some SVG tracks.

SENTRY 1000 Pneumatic

The SENTRY 1000 Pneumatic Exhaust Controller furnishes the same reliable, millisecond response to exhaust fluctuation as the other members of the SENTRY 1000 line with the added featute of a dual-stage pneumatic set point control.

SENTRY 1000 Manual

For applications requiring a single set point, the SENTRY 1000 Manual provides exhaust regulation with manual set point control, minimizing cost.

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